Author: zppiot

Last October we told you about Canon’s nanoimprint lithography (NIL) technology that stamps the circuitry design onto a silicon wafer instead of etching it like ASML’s extreme ultraviolet (EUV) machines do. The Financial Times (via Tom’sHardware) says that Canon has been working on this technology for 15 years and because it doesn’t use lasers to create the pattern on a wafer, the process uses as much as 90% less power than a traditional EUV machine.NIL technology can be used to build chips using a 5nm process node and eventually, it could be used to help produce 2nm chips. The lithography…